Sputtering Equipment
11/11/2021 - 11:50 PM 57 views
Technical parameters
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Vaccum chamber (10-6)
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Material: stainless steel
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Inside width: 420 mm
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Inside depth: 480 mm
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Inside height: 550 mm
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RF/DC co-sputtering capable (one RF gun and one DC gun running simultaneously)
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Samples holder
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The 8 inch (200 mm) diameter sample holder allows to hold 1 sample up to 8 inches (200 mm) in diameter or 4 samples for 2 inch diameter.
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Speed of rotation of sample holder: 0 – 20 rpm
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Infrared heater: 750°C.
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RF sputtering source power: 600 W at 13.56 MHz frequency
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DC sputtering source power: 1000 W, output voltage of 1000 V.
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Using a quartz probe to measure the sputtering film thickness.
Applications
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Leybold's UNIVEX 400 sputtering device is an important device in the fabrication technique of thin films based on physical methods and is integrated with both DC and RF sources. It can be used to fabricate single films as well as multilayer films for many different materials.