Sputtering Equipment

11/11/2021 - 11:50 PM

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Technical parameters

Vaccum chamber (10-6)
- Material: stainless steel
- Inside width: 420 mm
- Inside depth: 480 mm
- Inside height: 550 mm
- RF/DC co-sputtering capable (one RF gun and one DC gun running simultaneously)
Samples holder
- The 8 inch (200 mm) diameter sample holder allows to hold 1 sample up to 8 inches (200 mm) in diameter or 4 samples for 2 inch diameter.
- Speed of rotation of sample holder: 0 – 20 rpm
- Infrared heater: 750°C.
- RF sputtering source power: 600 W at 13.56 MHz frequency
- DC sputtering source power: 1000 W, output voltage of 1000 V.
- Using a quartz probe to measure the sputtering film thickness.

Applications

Leybold's UNIVEX 400 sputtering device is an important device in the fabrication technique of thin films based on physical methods and is integrated with both DC and RF sources. It can be used to fabricate single films as well as multilayer films for many different materials.

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Main Research Equipments

High Resolution Transmission Electron Microscope

Field Emission Scanning Electron Microscope

Spark Plasma Sintering (SPS) Furnace

Lithography Equipment (URE 2000S)

High Resolution Photoluminescent Microscope

Spectroscopic Ellipsometry (UVISEL Plus Horiba)

Highlights Information

HIGHLIGHTS
Scientific research, technology development, application and transfer of science and technology products and services; international cooperation and training in the field of materials science and technology and other related fields.

28 + Year of establishment
Established on June 11, 1993
240 + staffs
3 Professors, 9 Associate Professors, 13 Senior Researchers, 80 Ph.
Arwards
First Class Labor Medal