Lithography Equipment (URE 2000S)
11/11/2021 - 11:34 PM 39 views
Technical parameters
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Light source: (i-line) mercury lamp (wave length 365 nm)
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Exposure areas: 110mm×110mm ~ 150mm×150mm
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Wafer size: Minimum: 8mm x 8mm (f8mm); Maximum: 150mm × 150mm (f15mm)
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Mask size: 1, 4, 5, 6, 8 inch
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Illumination uniformity: ± 3.5% (110mm×110mm); ± 5% (150mm×150mm)
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Resolution: 0.8mm ~ 1.2mm
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Maximum film thickness of photoresist: (SU8): 600mm
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Aligning: bottom-sided alignment (BSA)
Applications
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The lithography equipment - URE 2000S can be used for fabrication of electronic devices (such as a FET, openning contact for welding wire,...), the fabrication of MEMS devices, electrodes and microheater of the sensor and masks.