Spectroscopic Ellipsometry (UVISEL Plus Horiba)

12/11/2021 - 08:53 AM
The UVISEL Plus ellipsometer offers the best combination of modularity and performance for advanced thin film, surface and interface characterization.
The new UVISEL Plus includes the newest acquisition technology designed to measure faster and more accurately than ever. FastAcq, the newest acquisition technology, is based on double modulation, designed for real world thin film characterization. Based on a new electronic, data processing and high speed monochromator, the new FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution.
Based on phase modulation technology, the UVISEL Plus ellipsometer provides a powerful optical design to continuously cover the spectral range from 190 to 2100 nm. High quality data are delivered across the whole spectral range in terms of high accuracy, high resolution measurements and excellent signal to noise ratio.

Technical parameters
  • Spectral range: from 190 to 2100 nm
  • Detection: High resolution monochromator coupled to sensitive detectors
  • Spot size: 1 mm
  • Goniometer: Manually adjustable angle from 55° to 90° by step of 5°
  • Automation sample stage: 200x200mm XY sample stage, manual height (4mm) and tilt adjustment
  • Accuracy: Ψ= 45°±0.01° and Δ=0°±0.01° measured in straight-through air configuration1.5 – 5.3 eV
  • Repeatability: NIST 1000Å SiO2/Si (190-2100 nm): d ± 0.1 %
Applications
  • Spectroscopic ellipsometry has been applied to evaluate optical constants and thin-film thicknesses of samples.
  • The application area of spectroscopic ellipsometry has been expanded recently, as it allows process diagnosis on the atomic scale from real-time observation.
INSTITUTE OF MATERIALS SCIENCE
© Copyright belongs to the Institute of Materials Science.